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Plasma Etching Chamber Parts CNC Machining for Semiconductor Tools

Plasma etching chamber parts are precision-engineered components with plasma-resistant surfaces and thermal stability used for gas flow uniformity and temperature control during dry etching, ashing, and surface treatment steps of semiconductor fabrication. At Zintilon, we focus on custom CNC machining of chamber liners, electrode plates, gas distribution rings, and RF coupling components to design and manufacture with the most sophisticated level of plasma durability and dimensional stability for the permanent plasma processing critical to semiconductor application.
  • Machining for precise plasma uniformity and process control
  • Tight tolerances up to ±0.0003 in for chamber sealing accuracy
  • Precision milling, drilling & plasma-resistant surface finishing
  • Support for rapid prototyping and full-scale production
  • ISO 9001-certified manufacturing with semiconductor tools expertise


Trusted by 15,000+ businesses

Why Semi-conductor Companies
Choose Zintilon

prductivity

Increased Productivity

Engineers get time back by not dealing with immature supply chains or lack of supply chain staffing in their company and get parts fast.

10x

10x Tighter Tolerances

Zintilon can machine parts with tolerances as tight as+/ - 0.0001 in -10x greater precision compared to other leading services.

world

World Class Quality

Zintilon provides aerospace parts for leading aerospace enterprises, verified to be compliant with ISO9001 quality standard by a certified registrar. Also, our network includes AS9100 certified manufacturing partners, as needed.

From Prototyping to Mass Production

Zintilon is ISO 9001 certified and provides engineered components to the manufacturers of semiconductor equipment, the suppliers of plasma tools, and the integrators of dry etch systems worldwide.

Prototype Plasma Etching Chamber Parts

Obtain chamber component assembly prototypes, duplicating your design to the finest detail, and confirming plasma uniformity, thermal management, sealant interface testing, and process validation prior to the commencement of production of the large volume semiconductor tools.

Key Points:

  • Rapid prototyping with high precision

  • Tight tolerances (±0.0003 in)

  • Test plasma distribution, thermal management, and durability early


3 Axis CNC Machined Stainless Steel Passivation

EVT – Engineering Validation Test

Most designs focus on configuration and are plasma, thermally stable, and vacuum sealed design requirements. Validation of prototype design should outline potential outgassing and thermal expansion issues to mitigate the prototype adjustments plasma control process uniformity requirements.

Key Points:

  • Validate prototype functionality

  • Rapid design iterations

  • Ensure readiness for production


Anodized Aluminum 1024x536

DVT – Design Validation Test

To define semiconductor systematic performance to required uniformity and process repeatability plasma resistance and thermal cycling of chamber geometry and materials should be varied on designs of components to be plasma etched.

Key Points:

  • Confirm design integrity and plasma specifications

  • Test multiple materials and configurations

  • Ensure production-ready performance


design aluminium

PVT – Production Validation Test

Asses production capacity and production controllability of plasma chamber components and production system controllability gaps. The emphasis is to improve control system gaps to provide system balance in the manufacturing process flow

Key Points:

  • Test large-scale production capability

  • Detect and fix process issues early

  • Ensure consistent part quality


Anodized Titanium Fastener

Mass Production

To efficiently produce plasma resistant chamber components that ensure reliable performance in semiconductor tools and on time delivery to users of process tools is our primary business objective.

Key Points:

  • Consistent, high-volume production

  • Precision machining for semiconductor quality

  • Fast turnaround with strict quality control


production

Simplified Sourcing for
the Semi-conductor Industry

Our aviation industry parts manufacturing capabilities have been verified by many listed companies. We provide a variety of manufacturing processes and surface treatments for aerospace parts including titanium alloys and aluminum alloys.

Explore Other Semiconductor Components

Browse our complete selection of CNC machined semiconductor components, crafted for durability and ultra-tight tolerances. From precision tooling and fixture parts to vacuum chambers and wafer handling systems, we deliver solutions tailored to advanced semiconductor production.

Semiconductor Tools, Plasma Etching Chamber Parts, Machining Capabilities

We Plasma Etching Chamber Parts CNC Machining for Semiconductor Tools to Plasma Tools with our CNC multi-axis machining centers and advanced surface finishing systems. Each chamber liner, electrode plate, gas distribution showerhead, and RF coupling ring with thermal management is designed to optimize plasma uniformity and minimize particle generation while maintaining reliable performance throughout thousands of etching cycles. Our company performs precision CNC milling while ensuring the flatness of chamber mounting surfaces is within +/- 0.01 mm. We also perform high-precision drilling while ensuring the hole diameters do not exceed +/- 0.025 mm, thread milling for the creation of vacuum-tight connections, and specialized surface finishes to ensure resistance to plasma, as well as low particulate generation. In addition, we perform leak testing and validation for plasma exposure. Every piece that we manufacture for the plasma chamber is made with aluminum 6061-T6, which also has anodized coating for lightweight construction and corrosion protection, as well as stainless steel 316L which is also compatible with vacuum and cleanroom standards, anodized aluminum that has a hardcoat with a thickness of up to 50 µm, and specialized materials such as quartz (SiO₂) which is chemically inert and transparent to plasma, graphite which is highly plasma resistant to high temperatures, and ceramic materials (Al₂O₃, Y₂O₃) which possess superior dielectric properties and plasma erosion resistance. We guarantee outstanding plasma erosion resistance, with an erosion rate of less than 1 µm for every 1000 hours, an uninterrupted operation of the system over a wide range of temperatures (25 to 400 degrees centigrade), excellent vacuum compatibility with a leak rate of less than 1 x 10 to the -9 torr·L/s, and a surface finish within the range of 0.8 to 3.2 Ra microns, optimized for plasma processing environments.
milling

CNC Machining

sheet metal

Sheet Metal Fabrication

edm

Wire EDM

casting

Metal Casting

Aerospace
Materials & Finishes

Materials
We provide a wide range of materials, including metals, plastics, and composites.
Finishes
We offer superior surface finishes that enhance part durability and aesthetics for applications requiring smooth or textured surfaces.

Specialist Industries

you are welcome to emphasize it in the drawings or communicate with the sales.

Materials for Plasma Etching Chamber Parts

Our CNC machine shop utilizes and provides plasma etching chamber components the cross-section of 15+ plasma resistant materials, vacuum compatible alloys, and ceramic composites for enduring rapid prototyping, precision, semiconductor apparatus, and the manufacture and sustainment of consistent quality to the SEMI and vacuum standards.
Stainless steel Image

Stainless steel alloys have high strength, ductility, wear and corrosion resistance. They can be easily welded, machined and polished. The hardness and the cost of stainless steel is higher than that of aluminum alloy.

Price
$ $ $
Lead Time
< 7 days
Tolerances
Down to ±0.005 mm
Max part size
3000*2200*1100 mm
Min part size
2*2*2 mm
Aluminum Image

High machinability and ductility. Aluminum alloys have good strength-to-weight ratio, high thermal and electrical conductivity, low density and natural corrosion resistance.

Price
$ $ $
Lead Time
< 7 days
Tolerances
Down to ±0.003 mm
Max part size
3000*2200*1100 mm
Min part size
2*2*2 mm
Titanium Image

Titanium is an advanced material with excellent corrosion resistance, biocompatibility, and strength-to-weight characteristics. This unique range of properties makes it an ideal choice for many of the engineering challenges faced by the medical, energy, chemical processing, and aerospace industries.

Price
$$$
Lead Time
< 10 days
Tolerances
Down to ±0.005 mm
Max part size
3000*2200*1100 mm
Min part size
2*2*2 mm
Steel Image

Steel is a strong, versatile, and durable alloy of iron and carbon. Steel is strong and durable. High tensile strength, corrosion resistance heat and fire resistance, easily molded and formed. Its applications range from construction materials and structural components to automotive and aerospace components.

Price
$ $ $ $ $
Lead Time
< 10 days
Tolerances
Down to ±0.001 mm (routing)
Max part size
3000*2200*1100 mm
Min part size
2*2*2 mm
Bronze Image

Highly resistant to seawater corrosion. The material’s mechanical properties are inferior to many other machinable metals, making it best for low-stress components produced by CNC machining.

Price
$ $ $ $ $
Lead Time
< 10 days
Tolerances
Down to ±0.005 mm
Max part size
3000*2200*1100 mm
Min part size
2*2*2 mm
Brass Image

Brass is mechanically stronger and lower-friction metal properties make CNC machining brass ideal for mechanical applications that also require corrosion resistance such as those encountered in the marine industry.

Price
$$$
Lead Time
< 10 days
Tolerances
Down to ±0.005mm
Max part size
3000*2200*1100 mm
Min part size
2*2*2 mm
Copper Image

Few metals have the electric conductivity that copper has when it comes to CNC milling materials. The material’s high corrosion resistance aids in preventing rust, and its thermal conductivity features facilitate CNC machining shaping.

Price
$$$
Lead Time
< 10 days
Tolerances
Down to ±0.005 mm
Max part size
3000*2200*1100 mm
Min part size
2*2*2 mm
Zinc Image

Zinc is a slightly brittle metal at room temperature and has a shiny-greyish appearance when oxidation is removed.

Price
$ $ $ $ $
Lead Time
< 10 days
Tolerances
Down to ±0.005 mm
Max part size
3000*2200*1100 mm
Min part size
2*2*2 mm
Iron Image

Iron is an indispensable metal in the industrial sector. Iron is alloyed with a small amount of carbon – steel, which is not easily demagnetized after magnetization and is an excellent hard magnetic material, as well as an important industrial material, and is also used as the main raw material for artificial magnetism.

Price
$ $ $ $ $
Lead Time
< 10 days
Tolerances
Down to ±0.005 mm
Max part size
3000*2200*1100 mm
Min part size
2*2*2 mm
Magnesium Image

Due to the low mechanical strength of pure magnesium, magnesium alloys are mainly used. Magnesium alloy has low density but high strength and good rigidity. Good toughness and strong shock absorption. Low heat capacity, fast solidification speed, and good die-casting performance.

Price
$ $ $ $
Lead Time
< 7 days
Tolerances
Down to ±0.005 mm
Max part size
3000*2200*1100 mm
Min part size
2*2*2 mm
Let’s Build Something Great, Together

FAQs: Plasma Etching Chamber Parts for Semiconductor Tools Applications

Chamber parts of plasma etching should contain precision and custom machining of the chamber liner components with dimensional tolerances of ±0.050 mm, electrodes of the chamber having flatness of ±0.025 mm to induce uniform plasma, gas distribution shower heads of 50 to 500 holes to guarantee ±3 percent uniformity of flow and plasma, RF coupling rings for matching value of impedance and micro to nano in range of ±5 percent, and various process kit components (focus rings, edge rings) with matching of thermal expansion to silicon wafers. There are some of these components in the kit that require vacuum sealing of the set, with leak rates below 1×10⁻⁹ torr·L/s, thermal erosion stability with degradation rates on the range of 1 µm of erosion in 1000 working hours, stability with regional thermal cycling of 25°C to 400°C, and generation of particles below 0.01 greater than 0.1 micron particles in series per cm² for exhausting cycles of plasma processing greater than 10,000 cycles will be required, and these parts will also require sit.

Anodized aluminum 6061-T6 has a low density of 2.7 g/cm³, is easy to work with and can achieve a surface finish of 1.6 Ra microns and lower, has a 25 to 50 µm thick anodized plasma resistant coating, and has a thermal conductivity of 167 W/m·K which allows for sufficient heat dissipation. 316L stainless steel has the best vacuum compatibility of the materials with an outgassing rate of less than 1×10⁻⁸ torr·L/s·cm², is cleanroom compatible, has corrosion resistant plasma chemistries, and has a thermal expansion of 16 µm/m·°C. Ceramics, specifically Al2O3 and Y2O3, have the best resistance to plasma erosion with wear rates on the order of 10 to 50 times less than that of metals, can withstand temperatures up to 1500°C, have good dielectric strength which allows for RF isolation, and are inert to fluorine and chlorine containing plasma chemistries.

Through 5 axis CNC milling, gas chambers with complex geometrical shapes are achieved with a tolerance of ± 0.025 mm. Also, gas distribution holes are drilled precisely with a diameter deviation of ± 0.025 mm and a positional deviation of ± 0.050 mm. High speed rotary cnc machining provides with chamber parts with a diameter of 1.6 Ra microns. Vacuum sealing threads with 2B class tolerance are produced by thread milling. Wire EDM processes are able to cut in a tolerance of ± 0.01 mm to make intricate designs in cooling channels of electrodes and is the finish technology. EDM is best to make pieces with a diameter of 300 mm. Depth of O-ring grooves is achieved with a deviation of ± 0.050 mm and the surface finish also is 0.8 Ra microns which is best for good sealing of chambers.

The tolerances we maintain for chambers are: flatness at ±0.025 mm for even plasma gaps, gas hole diameters at ±0.025 mm for flow uniformity within ±3% for O-ring grooves with depth tolerances of ±0.050 mm, for leak rates >1×10⁻⁹ torr·L/s, electrode parallelism at ±0.050 mm for reliable RF coupling, mounting hole position at ±0.075 mm, a surface finish of 0.8 to 3.2 Ra microns for plasma resistance, and overall ±0.100 mm. These tolerances support plasma uniformity with etch rates that have a deviation of less than ±5% for the entire wafer, vacuum integrity with base pressures of less than 1×10⁻⁷ torr, thermal cycling stability from room to 400°C, and a life expectancy of 10,000 RF hours.

Yes, we provide rapid prototyping to verify fit and test assembly, with same-day CAD-to-part capability available for critical projects. For custom automation cells and research platforms, we perform low-volume production of 20 to 500 brackets. For standardized robot models, we perform high-volume production of thousands to tens of thousands of brackets annually, incorporating complete dimensional inspection, flatness verification, and material certifications.
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